Computational lithography [electronic resource] / Xu Ma and Gonzalo R. Arce.
Material type: TextSeries: Wiley series in pure and applied opticsPublication details: Oxford : Wiley-Blackwell, 2010Description: xv, 226 p. : illSubject(s): Microlithography -- Mathematics | Integrated circuits -- Design and construction -- Mathematics | Photolithography -- Mathematics | Semiconductors -- Etching -- Mathematics | Resolution (Optics)Genre/Form: Electronic books.DDC classification: 621.381531 LOC classification: TK7872.M3 | M3 2010Online resources: Click to ViewNo physical items for this record
Includes bibliographical references and index.
Electronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries.
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