000			01865nam a2200421Ia 4500
001			EBC3377403
003			MiAaPQ
005			20240121043934.0
006			m o d |
007			cr cn|||||||||
008			050323s1995 dcu s 000 0 eng d
020			_z0309575168
035			_a(MiAaPQ)EBC3377403
035			_a(Au-PeEL)EBL3377403
035			_a(CaPaEBR)ebr10071430
035			_a(OCoLC)923270352
040			_aMiAaPQ _cMiAaPQ _dMiAaPQ
050		4	_aTA2020 _b.P5 1995
082	0	4	_a621.044 _222
245	0	0	_aPlasma processing and processing science _h[electronic resource] / _cPanel on Plasma Processing, Naval Studies Board, Commission on Physical Sciences, Mathematics, and Applications, National Research Council.
260			_aWashington, D.C. : _bNational Academy Press, _c1995.
300			_ax, 35 p.
490	1		_aNRL strategic series
500			_aCommittee chair: Francis F. Chen.
500			_aThis work was performed under Department of Navy Contract N00014-93-C-0089 issued by the Office of Naval Research under contract authority NR 201-124.
533			_aElectronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries.
650		0	_aPlasma engineering.
650		0	_aSemiconductors _xEtching.
650		0	_aPlasma etching.
655		4	_aElectronic books.
700	1		_aChen, Francis F., _d1929-
710	2		_aNational Research Council (U.S.). _bPanel on Plasma Processing.
710	2		_aNational Research Council (U.S.). _bNaval Studies Board.
710	2		_aNational Research Council (U.S.). _bCommission on Physical Sciences, Mathematics, and Applications.
710	2		_aProQuest (Firm)
830		0	_aNRL strategic series.
856	4	0	_uhttps://ebookcentral.proquest.com/lib/bacm-ebooks/detail.action?docID=3377403 _zClick to View
999			_c203635 _d203635