Ma, Xu,  1983- <br/><br/>
Computational lithography  [electronic resource] / 
Xu Ma and Gonzalo R. Arce. 
 - Oxford :  Wiley-Blackwell,  2010. 
 - xv, 226 p. :  ill. 
 - Wiley series in pure and applied optics .
 - Wiley series in pure and applied optics. .
<br/><br/>Includes bibliographical references and index. 
<br/><br/><br/>Electronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries. 
<br/><br/><label>ISBN: </label>
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microlithography--Mathematics.<br/>Integrated circuits--Design and construction--Mathematics.<br/>Photolithography--Mathematics.<br/>Semiconductors--Etching--Mathematics.<br/>Resolution (Optics)
<br/><br/><label>Index Terms--Genre/Form: </label><br/>Electronic books.
<br/><br/><label>LC Class. No.: </label>TK7872.M3  / M3 2010 
<br/><br/><label>Dewey Class. No.: </label>621.381531